Laser lithography of nanostructures

We have two directions in nanofabrication - two-photon nanolithography and laser interference lithography.

Two-photon photolithography

Two-photon polymerization lithography (2PP) is a unique method of laser structuring. It is based on non-linear absorption in focal volume and allows high resolution in three dimensions. This lithographic method guarantees precise control of geometrical shape of manufactured structures which makes it an excellent candidate for the fabrication of various photonic structures. 

 

Laser interference lithography

In this maskless lithography technique, the standing wave pattern that exists at the intersection of two coherent laser beams is used to expose a photosensitive layer.
 

 

Publications

Articles

  1. A. K. Petrov, V. O. Bessonov, K. A. Abrashitova, N. G. Kokareva, K. R. Safronov, A. A. Barannikov, P. A. Ershov, N. B. Klimova, I. I. Lyatun, V. A. Yunkin, M. Polikarpov, I. Snigireva, A. A. Fedyanin, and A. Snigirev
    "Polymer X-ray refractive nano-lenses fabricated by additive technology"

    Optics Express

    25
    13
    14173-14181
    2017